Silicon oxide film deposition CVD equipment
Compatible with 3-inch wafers! It features a compact design that achieves space-saving.
This product is a CVD device for depositing silicon oxide. It features a compact design that achieves space-saving. The internal surface treatment is electropolishing, and the chamber material is SUS316. Additionally, it is compatible with 3-inch wafers. 【Features】 ■ Deposits silicon oxide ■ Compact design that achieves space-saving ■ Compatible with 3-inch wafers *For more details, please refer to the external link page or feel free to contact us.
- Company：和泉テック
- Price：Other
